Laser ion source will produce a new generation of semiconductors
Thursday, October 20, 2011 - 09:31
in Physics & Chemistry
For ion implantation, that is 'hammering' ions into the surface layer of the material, conventional ion accelerators are commonly used. Laser ion sources are much simpler, cheaper and more universal. However, they emit wide energy ions usually accompanied by some admixtures. Scientists have now produced a unique laser ion source has been built which is equipped with a special system for accelerating ions to a chosen energy and for eliminating admixtures.