Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Tuesday, February 23, 2016 - 08:30
in Physics & Chemistry
Nano-electronics research center Imec and Nova Measuring Instruments, a leading innovator and key provider of metrology solutions for advanced process control used in semiconductor manufacturing, announced today at SPIE advanced lithography conference that they are jointly developing an innovative scatterometry approach to enable SAQP process control. The initial results will be presented during the conference.