Apparent roadblock in the development of quantum lithography
Friday, May 20, 2011 - 08:30
in Physics & Chemistry
(PhysOrg.com) -- Just when it began to appear that scientists had found a viable way around the problem of the blurring that occurs when using masks to create smaller and smaller silicon wafers for computer chips, a previous study on beam splitting optics showed that the new approach would not work, at least as it has thus far been proposed. A group of researchers explain why in a paper in New Journal of Physics.