SEMATECH Demonstrates Mask Pattern Alignment and Registration to Enable Double Patterning Lithography
Friday, July 30, 2010 - 06:35
in Physics & Chemistry
SEMATECH and the Semiconductor Metrology Systems division from Carl Zeiss announced today that Zeiss' next-generation photomask registration and overlay metrology system has successfully passed a key development milestone. The jointly developed system, called PROVE, demonstrated the measurement capability for advanced photomasks for the 32 nm node and below. In a series of test runs, the key specifications -- 0.5 nm repeatability and 1.0 nm accuracy in image placement, registration and overlay measurement -- were verified.