'Voltage Patterning' could be next step in nanostructure lithography
Monday, March 2, 2009 - 09:43
in Physics & Chemistry
(PhysOrg.com) -- "What you want these days is to have precise control of nanostructures. Using masks and optical techniques, it is possible to control how nanostructures grow for use in practical applications," David Field tells PhysOrg.com. "This is already done in silicon devices. However, with softer materials it is a bit more difficult. Our work could make it possible for a new method of patterning that would work with a number of materials."