High-speed femtosecond laser plasmonic lithography of graphene oxide film
Graphene analogues such as graphene oxide (GO) and its reduced forms (rGO) are fascinating carbon materials due to the complementary properties endowed by the sp3-sp2 interconversion, revealing the substitutability and potential for industrialization of integrated graphene devices. Appropriate micro/nanostructural design of GO and rGO for controlling the energy band gap and surface chemical activity is important for developing strategic applications. The femtosecond laser plasmonic lithography (FPL) technology is a qualified candidate for generating the required structures due to its efficiency, high-quality, flexibility and controllability. However, as both the theoretical and experimental explorations of this method are still in their infancy, micro/nanoprocessing of graphene materials using FPL has not been realized. The feasibility of implementing the technique in practical applications is still questionable because most related studies only highlight the characteristics of the structure obtained from the processing but often ignore the complementary changes in the properties of the material itself.