Higher dose sensitivity progress in novel photoresist platforms
Tuesday, May 13, 2014 - 09:01
in Physics & Chemistry
SEMATECH announced today that researchers have reported progress which could significantly improve resist sensitivity by incorporating metal oxide nanoparticles for extreme ultraviolet (EUV) lithography, bringing the technology another step toward enabling the development of high performance resists required to enable EUV for high-volume manufacturing (HVM).