Imec demonstrates first nanophotonics components on 300mm silicon photonics wafers using optical lithography
Tuesday, July 10, 2012 - 07:31
in Physics & Chemistry
Imec today announces the world-first realization of functional sub-100nm photonics components with optical lithography on 300mm silicon photonics wafer technology. Using 193nm immersion lithography, imec achieved the lowest propagation loss ever reported in silicon wire waveguides, and succeeded in patterning simpler and more efficient fiber couplers. Imecs achievement is an important step in bringing Si photonics technology in line with CMOS industry standards.