Sharpening focus in quantum photolithography
Wednesday, December 18, 2013 - 10:36
in Physics & Chemistry
Photolithography uses light beams to design thin geometric patterns on the substrates of semiconductors used in microelectronic devices. This is achieved using a chemical reaction on a light-sensitive chemical, called photoresist. The trouble is that the phenomenon of light diffraction does not permit highly accurate patterns. Now, a scientist has developed a quantum lithography protocol designed to improve the resolution of this technology.