Self-Assembling Block Copolymers Could Boost Data Storage

Thursday, August 14, 2008 - 13:56 in Physics & Chemistry

As lithographic materials and strategies come close to fundamental technical limits, increase performance and size could become prohibitively expensive. Further advances will require a new approach that is both commercially viable and capable of meeting the demanding quality-control standards of the industry. In a collaborative effort between academic and industry, chemical and biological engineering professors Paul Nealey and Juan de Pablo, and other colleagues from the UW-Madison NSEC partnered with researchers from Hitachi Global Storage Technologies to test a promising new twist on the traditional methods. In the Aug. 15 issue of Science, the team demonstrates a patterning technology that may revolutionize the field, offering performance improvements over existing methods even while reducing the time and cost of manufacturing. Read More...

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